Overview of Niobium sputtering Target Nb Niobium sheet cas no 7440-03-1
Metal powder is a common form of metal that has been processed into fine particles, ranging from a few micrometers to over 100 microns in diameter. It plays a crucial role in various industrial applications due to its unique properties and versatility.
Features of Niobium sputtering Target Nb Niobium sheet cas no 7440-03-1
Physical Characteristics
Particle Size: Ranging from nanometers to hundreds of micrometers, the size distribution significantly influences the powder’s flowability, packing density, and sintering behavior.
Shape: Particles can be spherical, irregular, flake-like, or dendritic, each shape affecting the final product’s mechanical properties and surface finish.
Purity: Depending on the production method, metal powders can achieve high levels of purity, critical for applications like electronics and aerospace where impurities can degrade performance.
Density: While less dense than their solid counterparts due to the presence of air between particles, metal powders can be densely packed during processing to approach the density of the solid metal.
Chemical Properties
Reactivity: Some metal powders, particularly aluminum and titanium, are highly reactive with air and moisture, necessitating careful handling and storage under inert atmospheres or vacuum.
Oxidation: Exposure to air can lead to surface oxidation, forming a passive layer that affects sintering and other processes. This can be managed through surface treatment or use of protective atmospheres.
(Niobium sputtering Target Nb Niobium sheet cas no 7440-03-1)
Parameters of Niobium sputtering Target Nb Niobium sheet cas no 7440-03-1
Niobium, with the chemical symbol Nb and atomic number 41, is a remarkable transition metal belonging to the platinum group in the periodic table. It is known for its unique combination of properties that make it a sought-after material in various industries, particularly in advanced technologies. The specific niobium sputtering target you mentioned, with CAS number 7440-03-1, is a key component used in thin film deposition processes.
Sputtering, a widely employed technique in semiconductor manufacturing and surface engineering, involves bombarding a solid material, like niobium, with high-energy ions to release atoms, which then adhere to a substrate. This method allows for the formation of thin layers of desired materials on a variety of surfaces, including metals, semiconductors, and insulators. The choice of niobium as a target is often due to its excellent electrical conductivity, low magnetic susceptibility, and high thermal stability, making it ideal for applications in superconducting magnets, microelectronics, and aerospace components.
CAS number 7440-03-1 refers to the standard nomenclature used to identify chemical substances, ensuring that researchers, manufacturers, and suppliers worldwide can easily locate and reference the specific product. The niobium sheet used in this target is typically made from high-purity niobium metal, which undergoes rigorous purification and processing to achieve the necessary purity and consistency for sputtering applications.
The niobium sheet for sputtering purposes may be rolled or cut into a specific thickness, ranging from microns to millimeters, depending on the desired film thickness and application requirements. It may also be alloyed with other elements like titanium or vanadium to enhance its mechanical properties, corrosion resistance, or magnetic behavior. The surface finish of the sheet, whether it’s polished, grit-blasted, or coated, is another critical factor that influences the efficiency and quality of the sputtering process.
The parameter “without any format” could refer to the lack of a predefined pattern or structure on the niobium sheet, which is common in sputtering targets. A smooth surface is preferred to ensure uniform deposition and minimize defects in the deposited films. However, it’s essential to note that the target might require a specific shape or configuration, such as circular, rectangular, or custom-cut, depending on the design of the sputtering system.
In conclusion, niobium sputtering target with CAS number 7440-03-1 is a crucial component in modern technology, offering exceptional properties for applications in superconductivity, electronics, and more. The target’s composition, purity, and manufacturing process are carefully controlled to ensure optimal performance in the sputtering process, ultimately contributing to the creation of high-quality thin films with precise characteristics. Understanding these details is vital for engineers and scientists working in the fields where niobium plays a significant role.
(Niobium sputtering Target Nb Niobium sheet cas no 7440-03-1)
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